Electrostatic Components

Electrostatic Einzel Lenses

NEC Einzel lenses are offered in three standard models made from all metal and ceramic materials for applications ranging up to 150 keV beam energy. NEC also builds custom lenses for specific requirements.

Electrostatic Quadrupole Lenses

Inside an electrostatic quadrupole lens NEC offers a wide variety of configurations of electrostatic quadrupole lenses for strong focusing. These all metal and ceramic, bakeable lenses are built to precise tolerances.

Electrostatic lenses require only modest power. Lens settings are proportional to the energy of the ions divided by their charge, independent of mass.

In addition to standard doublet and triplet models, NEC has built quadruplet quadrupole lenses for micro beams, steering quadrupole lenses, and offset charge selecting quadrupole lenses.

Electrostatic Beam Steerer

The steerer contains two orthogonal pairs of longitudinally separated plates for accurate, low power electrostatic steering of charged particle beams. Single axis steerers are also available.

NEC also manufactures custom design electrostatic deflectors for mass-independent analysis of MeV beams.

X-Y Raster Scanner

Developed by NEC for use on our production ion implantation systems, the electrostatic Ion Beam Raster Scan System is ideal for all applications requiring uniform ion deposition across a large surface.

The X and Y deflection plate pairs are longitudinally separated, and their design is electrostatically optimized by computer analysis. The NEC Scanner Power Supply provides X and Y triangular waveform output voltages that are individually adjustable to 20 kV. Scan voltages are at crystal-locked high frequencies. Monitor signals are available to display waveforms on an oscilloscope.

Electrostatic Microprobe Lens

Electrostatic microprobe lens This NEC electrostatic quadrupole quadruplet lens (S.H. Sie and C.G. Ryan, Nuclear Instruments and Methods B15 (1986) 664) is designed to be part of materials analysis systems such as RBS and PIXE to provide elemental analysis of surface structures only 20 microns across. Although the lens is mass independent, it is presently used on instruments designed primarily for proton and helium beams.

When part of a complete accelerator system including energy analysis and beam-limiting aperture, this lens allows for the use of non-destructive analysis techniques. Typically, beam diameter is 10 - 20 microns for a 3 MeV He+ beam produced by the Pelletron® accelerator when used with a beam limiting aperture of 200 microns at the object position. Currents are typically 2 - 4 particle nA of He+.

For orders, inquiries, comments and more information about our products, please contact our sales department at nec@pelletron.com

NEC Homepage About NEC What's New at NEC Links to Pelletrons®

Ion Beam Systems Vacuum Components Ion Beam Components

National Electrostatics Corporation
Last revised December 3, 2001 by Tim Davis, nec@pelletron.com
Comments and suggestions about this website are welcome.
URL: http://www.pelletron.com/escomp.htm