NEC provides both magnetic and electrostatic ion beam steering components:
The NEC magnetic ion beam steerer has routine use with ion beam accelerators to provide modest deflection of proton and helium beams with energies in the 1MeV to 5MeV range.
Each unit has individual use to provide control in one direction. X-Y steering requires two units. The steerers can move easily along the beamline for repositioning without breaking vacuum.
The NEC electrostatic ion beam steerer deflects ion beams independent of mass. It is routinely used on our injection beamlines for both large and small tandem accelerator systems.
The Electrostatic Ion Beam Steerer consists of two perpendicular pairs of electrostatic plates. We designed our standard beam steerer for ±5kV. However, various versions of the steerer are available, including ones designed for ±10kV and other voltage ratings requested by customers.
NEC originally designed our electrostatic neutral beam trap deflector for NEC ion implanters. It is also incorporated in ion beam analysis beamlines on Pelletron accelerator systems. The purpose of the deflector is to prevent neutrals from reaching the target area.
As with the neutral beam trap deflector, NEC originally designed the NEC scan system was for NEC ion implanters. It is also incorporated in ion beam analysis beamlines on Pelletron accelerator systems. The raster scanner assembly, when used with the related power supply and controller, provides a very reliable system for uniform ion beam deposition into flat targets.
We design the raster scanner power supply to position near the raster scanner assembly. It has a ratio of horizontal to vertical scanned frequencies, which are crystal locked, to optimize scan uniformity. Transformer coupling assures the complete absence of DC offset voltages.
NEC equips the raster scanner controller with two potentiometers for separate control of the horizontal and vertical scanning plate voltages. Each set of plates can be turned off individually to allow set up of one scan direction at a time.
The high energy end of a 1MV tandem Pelletron, with an implant beamline including raster scanner visible in the foreground and an IBA beamline in the background.
©2025 National Electrostatics Corp.
