For customers who are interested in upgrading an existing accelerator, we have a series of standard beamline designs prepared to meet a number of applications.
Product InfoNanosecond Pulsing System
National Electrostatics Corp. manufactures nanosecond pulsing and bunching systems for both tandem and single-ended electrostatic accelerators.
Product InfoSingle Wafer Implant Endstation
The NEC implant endstation provides accurate dose monitoring with uniform deposition.
Product InfoRaster Scanner System
The raster scanner assembly, when used with the related power supply and controller, provides a very reliable system for uniform ion beam deposition into flat targets.
Product InfoMicroprobe Beamline Extension
The microprobe beamline extension will provide beam diameters from 20 microns to 2 mm in an RBS target chamber.
Product InfoIon Beam Analysis (IBA) Endstation
The NEC IBA endstation can perform qualitative materials analysis using multiple techniques simultaneously, including RBS, ERD, NRA, PIXE, and more.
Product InfoHigh Resolution Rutherford Backscattering (HR RBS) Detector
This detector system can be added to an IBA endstation to significantly improve energy resolution and subsequently depth resolution for RBS analysis.
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