Ion Beam Sources

NEC manufactures both positive and negative ion sources for a variety of applications that range from a few microamps to over one hundred microamps.

Source of Negative Ions by Cesium Sputtering (SNICS)

Source of Negative Ions by Cesium Sputtering (SNICS)

This source is a versatile heavy-ion source capable of creating negative ion beams from all elements that form a stable negative ion.

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Multi-Cathode Source of Negative Ions by Cesium Sputtering (MC-SNICS)

Multi-Cathode Source of Negative Ions by Cesium Sputtering (MC-SNICS)

This source is most commonly used in Accelerator Mass Spectrometry (AMS) systems and can reliably create beams of many elements, some of which are C, Be, I, Cl, and Ca.

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RF Charge Exchange Ion Source

RF Charge Exchange Ion Source

This source is primarily used for the production of He- beams but can also produce H-, NH-, and O- beams.

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Direct Extraction Negative Ion Duoplasmatron

Direct Extraction Negative Ion Duoplasmatron

This source produces modest currents of negative ions from many molecular gases such as H-, O-, NH2-,CN-, and C-.

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Toroidal Volume Ion Source (TORVIS)

Toroidal Volume Ion Source (TORVIS)

This source is our highest current source for H, He, and D.

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RF Positive Ion Source

RF Positive Ion Source

This source produces over 100 μA of H and He and is used on high voltage decks as well as in single ended Pelletron Accelerators.

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Positive Ion Duoplasmatron Source

Positive Ion Duoplasmatron Source

This source is used for most gases that form stable positive ions, though is primarily used to produce H+, He+, O+, and Ar+.

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